Silicon tetrafluoride

Silicon tetrafluoride
What is Silicon tetrafluoride?
Silicon tetrafluoride is a chemical compound with CAS number 7783-61-1 and molecular formula SiF4. It is used in various industrial and research applications.
Applications
Silicon tetrafluoride is used in ion-implantation processes and as a precursor to fluorinated silica via plasma-assisted CVD. Mixtures of SiF4-SiH4-H2 have recently been used to deposit polycrystalline silicon thin films via remote plasma chemical vapor deposition (RPCVD).1,2 Such fluorinated thin films show visible photoluminescence (PL) at room temperature.3
Specifications
SiF4
104.08 g/mol
electronic grade
≥99.99%
<0.5 ppm Carbon monoxide (CO)
<1 ppm Argon + oxygen (Ar + O2)
<1 ppm Carbon dioxide (CO2)
<10 ppm Methane (CH4)
<3 ppm Nitrogen (N2)
<50 ppm Hydrogen fluoride (HF)
−86 °C(lit.)
3.57 g/mL at 25 °C(lit.)
Safety Information
GHS05
GHS06Danger
H300 +H310 + H330-H314
P260-P264-P280-P284-P301 + P310-P302 + P350
Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US)
−90 °C(lit.)
232-015-5
3
