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Bis(methyl-η5−cyclopentadienyl)dimethylhafnium

Bis(methyl-η5−cyclopentadienyl)dimethylhafnium chemical structure
CAS Number68193-43-1
FormulaHf[C5H4(CH3)]2(CH3)2
Mol. Weight366.80 g/mol

What is Bis(methyl-η5−cyclopentadienyl)dimethylhafnium?

Bis(methyl-η5−cyclopentadienyl)dimethylhafnium is a chemical compound with CAS number 68193-43-1 and molecular formula Hf[C5H4(CH3)]2(CH3)2. It is used in various industrial and research applications.

Applications

Advanced precursor for atomic layer deposition of HfO2 thin films. Hafnium and zirconium oxides are leading candidates to replace silicion dioxide as the gate oxide in a variety of semiconductor and energy applications.1 Excellent properties of HfO2 and ZrO2 films make them especially attractive for gate oxide replacement and as potential insulating dielectrics for capacitive elements in memory devices such as DRAM.2

Specifications

Linear Formula

Hf[C5H4(CH3)]2(CH3)2

Molecular Weight

366.80 g/mol

Boiling Point

80-120 °C/0.3-0.5 mmHg(lit.)

Density

1.60 g/mL±0.01 g/mL at 25 °C

Safety Information

GHS07GHS07
Signal Word

Warning

Hazard Statements

H315-H319-H335

Precautionary Statements

P261-P305 + P351 + P338

Melting Point

60 °C(lit.)

WGK Germany

3

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