Copper(II) trifluoroacetate hydrate
Copper(II) trifluoroacetate hydrate (CAS: 123333-88-0) is a copper salt with the chemical formula Cu(CO2CF3)2 · xH2O. Exhibiting a molecular weight of 289.58 on an anhydrous basis, this compound finds application as a precursor in materials science, particularly in micro/nanoelectronics. Its properties make it suitable for solution deposition techniques, contributing to the fabrication of advanced electronic components and functional materials.
Materials Science Precursor
Copper(II) trifluoroacetate hydrate serves as a valuable precursor in the field of materials science. It can be employed in the synthesis of novel copper-containing materials with tailored properties for various advanced applications.
Micro/Nanoelectronics Fabrication
This compound is utilised in micro- and nanoelectronics for the deposition of thin films or nanostructures. Its controlled decomposition or reaction allows for the precise formation of copper-based layers critical in semiconductor manufacturing and device fabrication.
Solution Deposition Techniques
As a precursor for solution deposition, Copper(II) trifluoroacetate hydrate is suitable for techniques such as spin coating or dip coating. These methods enable the uniform application of precursor solutions onto substrates for creating functional electronic or optical layers.
| Molecular weight | 289.58 (anhydrous basis) |
|---|---|
| Linear formula | Cu(CO2CF3)2 · xH2O |
Hazard statements
- H315Causes skin irritation
- H319Causes serious eye irritation
- H335May cause respiratory irritation
Precautionary statements
- P261Avoid breathing dust, fume, gas or vapours
- P305IF IN EYES
| Protective equipment | dust mask type N95 (US), Eyeshields, Gloves |
|---|---|
| Water hazard class (WGK, DE) | 3 |
| Hazard codes (EU) | Xi |
| Risk statements (R) | 36/37/38 |
| Safety statements (S) | 26 |
Hazard information is provided for guidance. Always consult the product Safety Data Sheet (SDS), available on request, before handling.
Documentation
Every batch ships with a Certificate of Analysis covering assay, identity and purity; the grade is confirmed against your enquiry. Safety Data Sheets and technical data sheets are available on request.
Supply & logistics
Samples for technical evaluation; bulk MOQ by grade and packaging. In-stock material ships in 7–10 working days, worldwide, with full export documentation.
What is Copper(II) trifluoroacetate hydrate used for?
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Copper(II) trifluoroacetate hydrate is primarily used as a precursor in materials science, particularly in micro/nanoelectronics, and for solution deposition techniques.
What is the CAS number and formula for Copper(II) trifluoroacetate hydrate?
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The CAS number is 123333-88-0 and the chemical formula is Cu(CO2CF3)2 · xH2O.
What grade and purity does Tech Serve Solutions supply?
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Tech Serve Solutions supplies Copper(II) trifluoroacetate hydrate typically as a technical or research grade material. We do not represent this product as USP, BP, or EP grade.
How should Copper(II) trifluoroacetate hydrate be handled?
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Handle Copper(II) trifluoroacetate hydrate with appropriate personal protective equipment, including a dust mask (type N95 or equivalent), eyeshields, and gloves. Avoid breathing dust and ensure adequate ventilation. It is classified as a Warning with hazards including skin irritation (H315), eye irritation (H319), and respiratory irritation (H335).
Is Copper(II) trifluoroacetate hydrate a controlled substance?
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Based on the provided data, Copper(II) trifluoroacetate hydrate is not indicated as a controlled substance.
How is Copper(II) trifluoroacetate hydrate packed and shipped?
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Copper(II) trifluoroacetate hydrate is carefully packed according to international shipping regulations for chemical substances and can be exported globally by Tech Serve Solutions.
How can I request a sample or quote for Copper(II) trifluoroacetate hydrate?
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To request a sample or a quote for Copper(II) trifluoroacetate hydrate, please contact our sales team via the website or provide your details through the product enquiry form.
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