Tetrakis(diethylamido)hafnium(IV)
Tetrakis(diethylamido)hafnium(IV), identified by CAS number 19824-55-6 and molecular formula [(CH2CH3)2N]4Hf, is a high-purity hafnium compound. With a molecular weight of 467.01 g/mol, it is primarily utilised as a precursor in chemical vapour deposition (CVD) and atomic layer deposition (ALD) processes. This material is essential for advanced applications in microelectronics and materials science, enabling the deposition of thin films with precise control.
- IUPAC
- Tetrakis(diethylamino)hafnium(IV)
![Tetrakis(diethylamido)hafnium(IV) ([(CH2CH3)2N]4Hf) — chemical structure, CAS 19824-55-6; Materials Science, fine chemical supplied by Tech Serve Solutions](/_next/image?url=https%3A%2F%2Fpub-f4d920c906024441a773a96f7098e551.r2.dev%2Fimages%2Fproducts%2F19824-55-6.png&w=3840&q=75)
Chemical Vapour Deposition (CVD)
Tetrakis(diethylamido)hafnium(IV) serves as a volatile precursor for depositing hafnium-containing thin films via CVD. These films are critical in the fabrication of advanced semiconductor devices and high-performance materials.
Atomic Layer Deposition (ALD)
This hafnium complex is widely employed as a precursor in ALD, enabling conformal coating of substrates with hafnium oxide or hafnium-based layers. Its controlled reactivity allows for precise film thickness and composition in microelectronics.
Materials Science
The compound finds application in materials research for synthesising novel hafnium-based materials with unique electronic, optical, or catalytic properties. Its use contributes to the development of next-generation functional materials.
Micro/Nanoelectronics
In the microelectronics industry, Tetrakis(diethylamido)hafnium(IV) is used for depositing dielectric layers, gate oxides, and other functional thin films essential for integrated circuit manufacturing.
| Molecular weight | 467.01 |
|---|---|
| Linear formula | [(CH2CH3)2N]4Hf |
| Assay | 99.99% |
| Boiling point | 130 °C/0.01 mmHg(lit.) |
| Density | 1.249 g/mL at 25 °C(lit.) |
Hazard statements
- H225Highly flammable liquid and vapour
- H261In contact with water releases flammable gas
- H315Causes skin irritation
- H319Causes serious eye irritation
- H335May cause respiratory irritation
Precautionary statements
- P210Keep away from heat, sparks and open flames. No smoking
- P231Handle under inert gas
- P261Avoid breathing dust, fume, gas or vapours
- P305IF IN EYES
- P422
| Protective equipment | Eyeshields, Faceshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter |
|---|---|
| Flash point | 10 °C / 50 °F |
| Transport (UN / ADR) | UN 3398 4.3/PG 2 |
| Water hazard class (WGK, DE) | 3 |
| Hazard codes (EU) | F,Xi |
| Risk statements (R) | 11-14-36/37/38 |
| Safety statements (S) | 16-26-36 |
| Supplemental hazards | Reacts violently with water. |
Hazard information is provided for guidance. Always consult the product Safety Data Sheet (SDS), available on request, before handling.
Documentation
Every batch ships with a Certificate of Analysis covering assay, identity and purity; the grade is confirmed against your enquiry. Safety Data Sheets and technical data sheets are available on request.
Supply & logistics
Samples for technical evaluation; bulk MOQ by grade and packaging. In-stock material ships in 7–10 working days, worldwide, with full export documentation.
What is Tetrakis(diethylamido)hafnium(IV) used for?
+
Tetrakis(diethylamido)hafnium(IV) is primarily used as a precursor in Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) for creating thin films in microelectronics and materials science applications.
What are the CAS number and chemical formula for Tetrakis(diethylamido)hafnium(IV)?
+
The CAS number is 19824-55-6, and the chemical formula is [(CH2CH3)2N]4Hf.
What grade and purity does Tech Serve Solutions supply?
+
Tech Serve Solutions supplies Tetrakis(diethylamido)hafnium(IV) with an assay of 99.99%. This product is not represented as USP, BP, or EP grade.
How should Tetrakis(diethylamido)hafnium(IV) be handled safely?
+
Tetrakis(diethylamido)hafnium(IV) is highly flammable and reacts violently with water. It is an irritant to the skin, eyes, and respiratory tract. Handle in a well-ventilated area, away from ignition sources and water, using appropriate personal protective equipment including eye protection, gloves, and respiratory protection. Refer to the Safety Data Sheet (SDS) for detailed handling instructions.
How is Tetrakis(diethylamido)hafnium(IV) packed, shipped, and exported?
+
This compound is typically packed in accordance with UN 3398 regulations for hazardous materials. Tech Serve Solutions is an experienced global exporter of fine chemicals, adhering to all relevant international shipping and customs regulations.
How can I request a sample or quote for Tetrakis(diethylamido)hafnium(IV)?
+
To request a sample or quote, please contact our sales team through the website or call us directly. Please specify the quantity and any required documentation.
▶ Related products
(11-Mercaptoundecyl)-N,N,N-trimethylammonium bromide
Micro / NanoElectronics
(11-Mercaptoundecyl)hexa(ethylene glycol)
C23H48O7S
Micro / NanoElectronics
(12-Phosphonododecyl)phosphonic acid
C12H28O6P2
Micro / NanoElectronics
(2,2,3,3,4,4,5,5,6,6,7,7,7-Tridecafluoroheptyl)oxirane
C9H5F13O
Micro / NanoElectronics
(2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-Heptadecafluorononyl)oxirane
C11H5F17O
Micro / NanoElectronics
(3-Chloropropyl)dimethoxymethylsilane
Cl(CH2)3Si(OCH3)2CH3
Micro / NanoElectronics
(3-Chloropropyl)trimethoxysilane
Cl(CH2)3Si(OCH3)3
Micro / NanoElectronics
(4-Bromophenyl)diphenylsulfonium triflate
C19H14BrF3O3S2
Micro / NanoElectronics▶ Explore more
3-Methyl-1,5-di-p-tolyl-1,4-pentazadiene
Chemical Synthesis
3-Methyl-1,5-pentanediol
Chemical Synthesis
3-Methyl-1-(2-methylphenyl)-1H-pyrazol-5-amine
C11H13N3
Chemical Synthesis
3-Methyl-1-(3′-sulfoamidophenyl)-5-pyrazolone
C10H11N3O3S
Chemical Synthesis