Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV)
Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV), CAS 309915-48-8, is an organometallic hafnium compound with the formula Hf(OC(CH3)2CH2OCH3)4 and a molecular weight of 591.05 g/mol. Supplied as an electronic grade liquid, this precursor is primarily utilised in materials science and microelectronics for thin film deposition processes via solution methods.
Thin Film Deposition
This hafnium precursor is used in chemical vapour deposition (CVD) and atomic layer deposition (ALD) processes to deposit high-k dielectric thin films in microelectronic device fabrication.
Materials Science Research
It serves as a valuable research chemical for developing novel hafnium-based materials and exploring their properties for advanced technological applications.
Precursor for Hafnium Oxide Films
The compound is a key source for depositing hafnium oxide (HfO2) and related high-permittivity dielectric layers, crucial for modern semiconductor manufacturing.
| Molecular weight | 591.05 |
|---|---|
| Linear formula | Hf(OC(CH3)2CH2OCH3)4 |
| Assay | 99.99% trace metals basis |
| Grade | electronic grade |
| Form | liquid |
| Boiling point | 135 °C/0.01 atm(lit.) |
| Density | 1.303 g/mL at 25 °C(lit.) |
| Storage temperature | 2-8°C |
| Protective equipment | Eyeshields, Gloves, half-mask respirator (EU), half-mask respirator (US), multi-purpose combination respirator cartridge (US) |
|---|---|
| Flash point | 68 °C / 154.4 °F |
| Transport (UN / ADR) | NA 1993 / PGIII |
| Water hazard class (WGK, DE) | 3 |
Hazard information is provided for guidance. Always consult the product Safety Data Sheet (SDS), available on request, before handling.
Documentation
Every batch ships with a Certificate of Analysis covering assay, identity and purity; the grade is confirmed against your enquiry. Safety Data Sheets and technical data sheets are available on request.
Supply & logistics
Samples for technical evaluation; bulk MOQ by grade and packaging. In-stock material ships in 7–10 working days, worldwide, with full export documentation.
What is Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV) used for?
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Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV) is primarily used as a precursor in materials science and microelectronics for the deposition of thin films, particularly high-k dielectric layers.
What is the CAS number and formula for Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV)?
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The CAS number is 309915-48-8 and the chemical formula is Hf(OC(CH3)2CH2OCH3)4.
What grade and purity does Tech Serve Solutions supply?
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Tech Serve Solutions supplies Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV) in electronic grade with a purity of 99.99% trace metals basis.
How should Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV) be handled and stored?
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Handling requires appropriate personal protective equipment, including eyeshields, gloves, and a suitable respirator. Store at 2-8°C. It is a combustible liquid with a flash point of 68°C (154.4°F).
Is Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV) a controlled substance?
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Based on the provided data, Tetrakis(1-methoxy-2-methyl-2-propoxy)hafnium(IV) is not listed as a controlled substance.
How is this chemical shipped and exported?
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This chemical is classified under NA 1993 / PGIII and is shipped and exported by Tech Serve Solutions in compliance with relevant regulations.
How can I request a quote or sample for this product?
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To request a quote or sample, please contact our sales team via the website or direct contact information provided by Tech Serve Solutions.
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