Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate)
Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate), CAS 14319-08-5, is an organometallic compound with the linear formula Al(OCC(CH3)3CHCOC(CH3)3)3 and a molecular weight of 576.78 g/mol. This aluminium chelate is primarily utilised as a precursor in chemical vapour deposition (CVD) and atomic layer deposition (ALD) processes for thin film applications.
- IUPAC
- Al(TMHD)3
- Synonyms
- 6-tetramethyl-3,5-heptanedionate),14319-08-5, Al(OCC(CH3)3CHCOC(CH3)3)3, Al(TMHD)3
CVD and ALD Precursor
Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate) serves as a volatile precursor in chemical vapour deposition (CVD) and atomic layer deposition (ALD) techniques. It enables the deposition of high-quality aluminium-containing thin films for electronic and materials science applications.
Materials Science
This compound finds application in materials science for the synthesis and modification of advanced materials. Its controlled decomposition allows for the incorporation of aluminium into various material matrices.
Micro/Nanoelectronics
In the microelectronics and nanoelectronics industries, Al(TMHD)3 is employed in deposition processes to create functional layers and structures critical for semiconductor fabrication and advanced device manufacturing.
| Molecular weight | 576.78 |
|---|---|
| Linear formula | Al(OCC(CH3)3CHCOC(CH3)3)3 |
| Assay | 98% |
| Melting point | 264-267 °C(lit.) |
| Protective equipment | Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter |
|---|---|
| Water hazard class (WGK, DE) | 3 |
Hazard information is provided for guidance. Always consult the product Safety Data Sheet (SDS), available on request, before handling.
Documentation
Every batch ships with a Certificate of Analysis covering assay, identity and purity; the grade is confirmed against your enquiry. Safety Data Sheets and technical data sheets are available on request.
Supply & logistics
Samples for technical evaluation; bulk MOQ by grade and packaging. In-stock material ships in 7–10 working days, worldwide, with full export documentation.
What is Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate) used for?
+
Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate) is used as a precursor in chemical vapour deposition (CVD) and atomic layer deposition (ALD) for thin film applications in materials science and micro/nanoelectronics.
What is the CAS number and formula for Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate)?
+
The CAS number is 14319-08-5, and the linear formula is Al(OCC(CH3)3CHCOC(CH3)3)3.
What grade and purity does Tech Serve Solutions supply?
+
Tech Serve Solutions supplies Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate) with an assay of 98%. This is a technical/research grade material, and TSS does not represent it as USP, BP, EP, or any other pharmacopoeia standard.
What are the safety and handling considerations for this compound?
+
When handling Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate), it is essential to wear eyeshields and gloves. A type N95 (US) or type P1 (EN143) respirator filter should be used. This compound is classified with WGK Germany 3.
How is this chemical packed and shipped?
+
Tech Serve Solutions, as a specialist global supplier and exporter, ensures appropriate packaging and compliant shipping for Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate) for both domestic and international destinations.
How can I request a sample or quote for Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate)?
+
To request a sample or a quotation for Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate), please contact our sales team through the website or via direct enquiry.
▶ Related products
(11-Mercaptoundecyl)-N,N,N-trimethylammonium bromide
Micro / NanoElectronics
(11-Mercaptoundecyl)hexa(ethylene glycol)
C23H48O7S
Micro / NanoElectronics
(12-Phosphonododecyl)phosphonic acid
C12H28O6P2
Micro / NanoElectronics
(2,2,3,3,4,4,5,5,6,6,7,7,7-Tridecafluoroheptyl)oxirane
C9H5F13O
Micro / NanoElectronics
(2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-Heptadecafluorononyl)oxirane
C11H5F17O
Micro / NanoElectronics
(3-Chloropropyl)dimethoxymethylsilane
Cl(CH2)3Si(OCH3)2CH3
Micro / NanoElectronics
(3-Chloropropyl)trimethoxysilane
Cl(CH2)3Si(OCH3)3
Micro / NanoElectronics
(4-Bromophenyl)diphenylsulfonium triflate
C19H14BrF3O3S2
Micro / NanoElectronics▶ Explore more
3-Methyl-1,5-di-p-tolyl-1,4-pentazadiene
Chemical Synthesis
3-Methyl-1,5-pentanediol
Chemical Synthesis
3-Methyl-1-(2-methylphenyl)-1H-pyrazol-5-amine
C11H13N3
Chemical Synthesis
3-Methyl-1-(3′-sulfoamidophenyl)-5-pyrazolone
C10H11N3O3S
Chemical Synthesis