3-Oxabicyclo[3.1.0]hexane-2,4-dione
3-Oxabicyclo[3.1.0]hexane-2,4-dione (CAS 5617-74-3), with a molecular weight of 112.08 g/mol, is a unique alicyclic compound. It serves as a valuable monomer in materials science, particularly for applications in micro/nanoelectronics and lithography due to its etch-resistant properties. This compound is also utilized in self-assembly processes and contact printing, demonstrating its versatility in advanced material fabrication.
- IUPAC
- 1,2-Cyclopropanedicarboxylic anhydride
- Synonyms
- 1,2-Cyclopropanedicarboxylic anhydride
![3-Oxabicyclo[3.1.0]hexane-2,4-dione (C5H4O3) — chemical structure, CAS 5617-74-3; Materials Science, fine chemical supplied by Tech Serve Solutions](/_next/image?url=https%3A%2F%2Fpub-f4d920c906024441a773a96f7098e551.r2.dev%2Fimages%2Fproducts%2F5617-74-3.png&w=3840&q=75)
Lithography Monomers
3-Oxabicyclo[3.1.0]hexane-2,4-dione functions as a key component in lithographic processes. Its structure contributes to etch-resistant properties, crucial for micro- and nano-patterning in semiconductor manufacturing.
Materials Science
As an alicyclic monomer, this compound is employed in the synthesis of advanced materials. It offers specific chemical characteristics suitable for developing polymers with tailored properties for electronic applications.
Micro/Nanoelectronics
This chemical is integral to the development of materials used in micro- and nanoelectronic devices. Its use in lithography enables the precise fabrication of intricate circuitry and components.
Self Assembly & Contact Printing
The compound's unique structure makes it suitable for applications involving self-assembly and contact printing techniques. These methods are vital for creating ordered nanostructures and advanced surfaces.
| Molecular weight | 112.08 |
|---|---|
| Empirical formula | C5H4O3 |
| Assay | 98% |
| Boiling point | 100-102 °C/5 mmHg(lit.) |
| Melting point | 59-61 °C(lit.) |
| Protective equipment | Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter |
|---|---|
| Water hazard class (WGK, DE) | 3 |
Hazard information is provided for guidance. Always consult the product Safety Data Sheet (SDS), available on request, before handling.
Documentation
Every batch ships with a Certificate of Analysis covering assay, identity and purity; the grade is confirmed against your enquiry. Safety Data Sheets and technical data sheets are available on request.
Supply & logistics
Samples for technical evaluation; bulk MOQ by grade and packaging. In-stock material ships in 7–10 working days, worldwide, with full export documentation.
What is 3-Oxabicyclo[3.1.0]hexane-2,4-dione used for?
+
3-Oxabicyclo[3.1.0]hexane-2,4-dione is used as an alicyclic monomer in materials science, particularly for lithography, micro/nanoelectronics, and self-assembly applications due to its etch-resistant properties.
What is the CAS number and formula for 3-Oxabicyclo[3.1.0]hexane-2,4-dione?
+
The CAS number is 5617-74-3 and the empirical formula is C5H4O3.
What grade and purity does Tech Serve Solutions supply?
+
Tech Serve Solutions supplies 3-Oxabicyclo[3.1.0]hexane-2,4-dione with an assay of 98%. TSS does not represent this product as USP/BP/EP or any other pharmacopoeia grade.
How is 3-Oxabicyclo[3.1.0]hexane-2,4-dione handled and stored safely?
+
Handling requires appropriate personal protective equipment, including eyeshields, gloves, and a P1 (EN143) or N95 (US) respirator filter. It is classified with WGK 2 in Germany, indicating it is hazardous to water.
How can I request a sample or quote for 3-Oxabicyclo[3.1.0]hexane-2,4-dione?
+
To request a sample or quote, please contact our sales department via the website or direct email, providing your specific requirements and shipping details.
Is 3-Oxabicyclo[3.1.0]hexane-2,4-dione shipped internationally?
+
Yes, Tech Serve Solutions is a global supplier and exporter of fine chemicals, and 3-Oxabicyclo[3.1.0]hexane-2,4-dione can be shipped internationally, subject to regulatory compliance.
▶ Related products

(11-Mercaptoundecyl)-N,N,N-trimethylammonium bromide
Micro / NanoElectronics

(11-Mercaptoundecyl)hexa(ethylene glycol)
C23H48O7S
Micro / NanoElectronics
(12-Phosphonododecyl)phosphonic acid
C12H28O6P2
Micro / NanoElectronics
(2,2,3,3,4,4,5,5,6,6,7,7,7-Tridecafluoroheptyl)oxirane
C9H5F13O
Micro / NanoElectronics
(2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-Heptadecafluorononyl)oxirane
C11H5F17O
Micro / NanoElectronics
(3-Chloropropyl)dimethoxymethylsilane
Cl(CH2)3Si(OCH3)2CH3
Micro / NanoElectronics
(3-Chloropropyl)trimethoxysilane
Cl(CH2)3Si(OCH3)3
Micro / NanoElectronics
(4-Bromophenyl)diphenylsulfonium triflate
C19H14BrF3O3S2
Micro / NanoElectronics▶ Explore more

3-Methyl-1,5-di-p-tolyl-1,4-pentazadiene
Chemical Synthesis

3-Methyl-1,5-pentanediol
Chemical Synthesis

3-Methyl-1-(2-methylphenyl)-1H-pyrazol-5-amine
C11H13N3
Chemical Synthesis
3-Methyl-1-(3′-sulfoamidophenyl)-5-pyrazolone
C10H11N3O3S
Chemical Synthesis